US10717646B2

Precision alignment of the substrate coordinate system relative to the inkjet …

University of Texas System

Abstract

A method and alignment system for minimizing errors in the deposition of films of tailored thickness. A first position on a stage is identified for optimal placement of a downward looking microscope (DLM) and an upward looking microscope (ULM) when alignment marks on the DLM and ULM are aligned, …

University: University of Texas System
Assignee: Board Of Regents, The University Of Texas System
Inventor: Sidlgata V. Sreenivasan
Priority date: May 20, 2016
Filing date: May 19, 2017
Grant date: July 21, 2020
Publication date: July 21, 2020
Language: en
PDF source: https://patentimages.storage.googleapis.com/02/c1/4b/16fab9aeb2f91b/US10717646.pdf
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