US20050271955A1

System and method for improvement of alignment and overlay for microlithography

University of Texas System

Abstract

The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.

University: University of Texas System
Assignee: Board Of Regents, The University Of Texas System
Inventor: Anshuman Cherala
Priority date: June 03, 2004
Filing date: June 02, 2005
Publication date: December 08, 2005
Language: en
PDF source: https://patentimages.storage.googleapis.com/4b/25/83/9517f3d24217ed/US20050271955A1.pdf
Metadata fetched: August 28, 2026 23:58