← All patents

US20080095878A1

Imprint Lithography Template Having a Feature Size Under 250 nm

University of Texas System

Abstract

The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.

University
University of Texas System
Assignee
Board Of Regents, University Of Texas System
Inventor
Todd Bailey
Priority date
October 12, 2000
Filing date
June 11, 2007
Publication date
April 24, 2008
Language
en
Metadata fetched
August 29, 2026 00:18