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US20130022785A1

Oligosaccharide/silicon-containing block copolymers for lithography …

University of Texas System

Abstract

The present invention discloses diblock copolymer systems that self-assemble to produce very small structures. These co-polymers consist of one block that contains silicon and another block comprised of an oligosaccharide that are coupled by azide-alkyne cycloaddition.

University
University of Texas System
Assignee
Board of Regents, The University of the Texas System
Inventor
Christopher John Ellison
Priority date
June 21, 2011
Filing date
June 20, 2012
Publication date
January 24, 2013
Language
en
Metadata fetched
August 29, 2026 00:21