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US20130266780A1

Polylactide/Silicon-containing Block Copolymers for Nanolithography

University of Texas System

Abstract

The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is …

University
University of Texas System
Assignee
Board Of Regents, The University Of Texas System
Inventor
Christopher John Ellison
Priority date
February 10, 2012
Filing date
February 07, 2013
Publication date
October 10, 2013
Language
en
Metadata fetched
August 29, 2026 00:21