US5047565A
University of Texas System
The present invention involves chemical compounds particularly useful for the preparation of thin films or layers of group 3/group 5 materials by MOCVD and other techniques. Such compounds may be represented as having the formulas [M(ER'R'')3]n or [RM(ER'R'')2]n or [R2M(ER'R'')]n wherein M is …