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US7122482B2

Methods for fabricating patterned features utilizing imprint lithography

University of Texas System

Abstract

One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of …

University
University of Texas System
Assignee
University Of Texas System
Inventor
Frank Y. Xu
Priority date
October 27, 2003
Filing date
October 27, 2003
Grant date
October 17, 2006
Publication date
October 17, 2006
Language
en
Metadata fetched
August 28, 2026 23:58