US7535549B2

System and method for improvement of alignment and overlay for microlithography

University of Texas System

Abstract

The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.

University: University of Texas System
Assignee: Board Of Regents, University Of Texas System
Inventor: Anshuman Cherala
Priority date: June 03, 2004
Filing date: June 02, 2005
Grant date: May 19, 2009
Publication date: May 19, 2009
Language: en
PDF source: https://patentimages.storage.googleapis.com/8a/06/b7/293ef0a6b201dd/US7535549.pdf
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