← All patents

US9120117B2

Polylactide/silicon-containing block copolymers for nanolithography

University of Texas System

Abstract

A diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block copolymer may be synthesized by a combination of anionic and ring opening …

University
University of Texas System
Assignee
Board Of Regents, The University Of Texas System
Inventor
Christopher John Ellison
Priority date
February 10, 2012
Filing date
February 07, 2013
Grant date
September 01, 2015
Publication date
September 01, 2015
Language
en
Metadata fetched
August 29, 2026 00:22