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US9834700B2

Polylactide/silicon-containing block copolymers for nanolithography

University of Texas System

Abstract

The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is …

University
University of Texas System
Assignee
Board Of Regents, The University Of Texas System
Inventor
Christopher J. Ellison
Priority date
February 10, 2012
Filing date
August 17, 2015
Grant date
December 05, 2017
Publication date
December 05, 2017
Language
en
Metadata fetched
August 29, 2026 00:24